4-Ethenylphenol acetate CAS 2628-16-2

Payment Type: L/C,T/T,D/P,Paypal,Money Gram,Western Union
Min. Order: 10 Gram
Delivery Time: 7 Days

Basic Info

Model No.: TF-2006

Additional Info

Packaging: As Buyer's Request

Productivity: 100Ton

Brand: Tianfu

Transportation: Ocean,Land,Air,DHL,TNT

Place of Origin: China

Supply Ability: 50Ton

Certificate: ISO

Port: Shanghai port,Qingdao port

Product Description

P-acetoxystyrene can be used to synthesize polyparahydroxystyrene as a main component of a photoresist (photoresist). Poly-p-hydroxystyrene series of chemically amplified photoresists are currently the mainstream photoresist products in the world, and are one of the key technologies for processing photo-etching integrated circuits and manufacturing chips. The photo-etching technology is developed from the production of 0.3-0.28μm line width to the deep ultraviolet light (wavelength 248nm) to produce 0.18μm line width, and the ultra-deep ultraviolet light (wavelength 193nm) can be used to trace the line width to 0. 11 μm microcircuit. 248nm photoresist usually uses poly-p-hydroxystyrene derivative as film-forming resin, aryl iodonium salt or sulfonium salt as photoacid generator, using chemical amplification technology to release photoacid generator under light The acid, then acid catalyzes the cross-linking of the polymer (negative gelation) or the deprotection reaction (positive gelatinization), thereby greatly increasing the photosensitivity.


Metal Contents


AI <10ppb  <1 
Ca  <10ppb   4.5
Mg  <10ppb   <1  
Cu <10ppb    <1  
Fe  <10ppb   <1  
Na  <10ppb   9.2
Ni  <10ppb   <1 
Zn <10ppb     <1  
K <10ppb    <1 
Mn <10ppb    <1 
Cr <10ppb    <1 
SN <10ppb    0.2
AS <01ppb    0.3
Test Items Specification Results
Appearance Colorless Liquid Colorless Liquid
Purity (GC) ≥99.0% (area) 99.22% (area)
Water content by KF
≤0.10% 0.02%
Clarity (10%(w/w)Methanol Soivent) Clear Clear
Total Acid Number ≤100(mgKOH/L) 13.8(mgKOH/L)

Polymerization inhibitor

200ppm-300ppm 256


Contact Person: Anson



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